Hebei Plasma Diamond Technology Co., Ltd.
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Deposition System

CVD Diamond Deposition System
For deposition CVD diamond wafers, DC Arc Plasma systems powered with 30KW range from LP60 to LP200. Large Area diamond wafers diameters range from 60mm to 200mm.
DC Arc Plasma System advantages:
• Large area  and homogenous CVD diamond can be achieved with the dynamic magnetism controlled Arc enlarger technique
• High stability and continuous working for a long time
• High quality deposition with high speed
• Different grades of CVD diamond can be achieved by adjusting the  parameters

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