R&D_Hebei Plasma Diamond Technology Co., Ltd.

Introduction of new type microwave plasma CVD diamond reactors
Introduction of new type microwave plasma CVD diamond reactors (a) (b) (c) (a) first homemade 75kW/915MHz ellipsoidal microwave plasma chemicalvapor deposition (MPCVD) reactor developed for growing large area high quality diamond film with high growth rate, (b) 10kW/2.45 GHz TM01 mode circumferential antenna-ellipsoidal cavity type MPCVD reator, (c) the plasma ignited in the reator High power microwave CVD diamond reactors with innovative design in the deposition chamber by which the coupling efficiency is enhanced, whilst the contamination to the microwave window is drastically reduced, have been successfully introduced, which include the ellipsoidal as well as the cylindrical type reactors
R&D for large area high quality freestanding diamond wafers
R&D for large area high quality freestanding diamond wafers suitable for high power laser window and high power microwave (Gyrotron) window, as well as for electronic applications. 3-5 inch (φ76-127mm) crack-free and high quality diamond films were prepared by optimizing deposition parameters These microwave reactors are fully functional, and the process parameters for fabrication of large size, high quality freestanding diamond disks suitable for the use as optical,laser, and microwave windows have been optimized.
Growth of large size high quality single crystal diamond
Growth of large size high quality single crystal diamond Large size (with a thickness exceeding 2mm) and high purity diamond single crystal grown by microwave plasma CVD. As per our examination, the sample color and clarity can all reach the gem grade level. With the optimization of process parameters, the crystal growth rate can reach up to 30 um/h, and the thickness tolerance of polishing sample can reach + / - 0.05 mm, crystallographic orientation deviation can reach ±2 ° and the surface roughness Ra < 30 nm. The full width at half maximum (FWHM) of diamond (400) peak in the X-ray rocking curve is only 0.008 (left), whilst the nitrogen content in the diamond single crystal isestimated to be less than 1.1 ppm from the tiny absorption peak at 270nm (right). Diamond single crystal with nitrogen content as low as 0.7ppm (700ppb) has also beensuccessfully obtained.
Thin film coatings by DC Arc Plasma Jet
Thin film coatings by DC Arc Plasma Jet As compared to HFCVD and MWCVD, one of the advantages for daimond thin coatings on hard metal alloy substrate (cemented carbide) by DC arc Plasma Jet is that the higherdeposition rate may depress the outward diffusion of the cobalt, and is beneficial for promoting the adhesion of the diamond coatings on hard metal substrate. Taking the fulladvantages ofthe DC Arc Plasma Jet, we are successfully developed the technology for adherent dismond thin film coatings on hard metal tool components, as well as on SiCseals, and large size silicon wafers. Particularly, innovative technology for diamond thin film coatings on the inner surface of deep cavity molds and tools has developed, andpotentially can be used in a wide variety application fields. Diamond thin film coated SiC sealing rings (left) and wire drawing dieswith irregular deep cavity by DC Arc Plasma Jet
Super high abrasive resistance CVD diamond
Grinding wheel dressing Dressing tools CVDD Compare with SCD Abrasive resistance Sharpness of dressed grinding wheel Goal investigate abrasion wear mechanism of CVD diamond while dressing grinding wheel Explore the capability of CVD diamond used for grinding wheel dressing application
Optimization for existing diamond film products
Optimization for existing diamond film products Continuous efforts have been paying on the optimization for our existing diamond film products in according to the feedbacks of our customers all over the world, andparticularly, to the ever-growing demands in the new fields of innovative applications. We are sincerely welcome any proposals and suggestions, and particularly, any problemsin using our diamond film products. We are very happy to know, and are ready to cooperate for finding the solution as soon as possible.
Deposition System
CVD Diamond Deposition System For deposition CVD diamond wafers, DC Arc Plasma systems powered with 30KW range from LP60 to LP200. Large Area diamond wafers diameters range from 60mm to 200mm. DC Arc Plasma System advantages: • Large area and homogenous CVD diamond can be achieved with the dynamic magnetism controlled Arc enlarger technique • High stability and continuous working for a long time • High quality deposition with high speed • Different grades of CVD diamond can be achieved by adjusting the parameters
Processing
Laser cutting system for CVD diamond YAG Laser Cutting System Due to the extreme hardness of the diamond, the mechanical cutting or sawing of the diamond wafers is not possible. YAG laser cutting system is applied for cutting them into desired shapes. Grinding and Polishing Polishing Machines After deposition, the coarse grained films are ground and polished to the desired thickness. To achieve it, a high speed lapping machine which can treat three samples simultaneously is used. Diamond wafers of 3″ in diameter can be polished with our equipment.

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